Magnesium Oxide Sputtering Target
Magnesium Oxide Sputtering Target
Purity: ≥99.9%
- Custom sizes and standard sizes in stock
- Quick Lead Time
- Competitive Price
Magnesium Oxide Sputtering Target is a ceramic material used in physical vapor deposition (PVD) processes to create thin films with insulating, optical, or dielectric properties. It offers high thermal stability, excellent insulation performance, and strong resistance to chemical corrosion, making it a reliable choice for coating applications in electronics, optics, and semiconductor industries. This target is typically used for depositing MgO films on substrates like glass, silicon, or metal to improve electrical insulation or optical reflectivity. As a leading supplier and manufacturer of premium graphite products, Shanghai Yuepeng can supply high-quality magnesium oxide sputtering target with various specifications and competitive prices, offering customized solutions to meet specific requirements.
Magnesium Oxide Sputtering Target Data Sheet
| Reference Code: | HTST37 |
| Color: | White or yellow |
| Chemical Formula: | MgO |
| Density: | 3.20 g/cm3 |
| Dimension: | customized |
| Shape: | Disc/Rectangular/Tube or customized |
| Bonding: | Bonding/Unbonding |
Magnesium Oxide Sputtering Target Description
Magnesium oxide sputtering targets are widely used in thin film deposition due to their excellent dielectric strength, high melting point, and chemical inertness. It enables the formation of stable, uniform coatings in various applications, including optical layers, barrier films, and electronic components. Its compatibility with different substrate materials and ability to perform under high-vacuum and high-temperature conditions make it a dependable material in PVD processes.
Magnesium Oxide Sputtering Target Specifications
| Circular Sputtering Targets | Diameter | 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0” up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20” |
| Thickness | 0.125”, 0.25” | |
Magnesium Oxide Sputtering Target Features
- High Purity: Offers excellent chemical stability and minimizes contamination during thin film deposition.
- Strong Thermal Stability: Maintains structural integrity at elevated temperatures during sputtering processes.
- Good Electrical Insulation: Ideal for applications requiring high dielectric strength and minimal conductivity.
- Uniform Film Formation: Ensures consistent and smooth thin film layers across various substrates.
- Customizable Dimensions: Available in various shapes and sizes to meet different equipment and process requirements.
Magnesium Oxide Sputtering Target Applications
- Optical Coatings: Magnesium oxide sputtering targets are widely used to deposit thin films for optical applications such as anti-reflective coatings, mirrors, and display panels, due to their excellent transparency and refractive properties.
- Semiconductor Manufacturing: They are used in semiconductor fabrication for insulating and dielectric layers in microelectronic devices, ensuring high performance and stability.
- Protective Coatings: MgO targets are applied in the production of wear-resistant and corrosion-resistant coatings for metals, ceramics, and glass substrates.
- Thin Film Capacitors: Magnesium oxide thin films, produced by sputtering, are utilized in capacitors to enhance dielectric strength and thermal stability in high-frequency circuits.
- Plasma Display Panels and LEDs: MgO sputtering targets are utilized to create protective and insulating layers in plasma display panels and LED devices, enhancing efficiency and lifespan.
Optical and electronic industries
Vacuum and Protective Atmosphere Furnaces
Semiconductor Thin Films
Vacuum and Plasma Systems
Semiconductor Equipment
Magnesium Oxide Material Properties
Magnesium Oxide Ceramic Machining
Magnesium oxide can be machined in green or bisque form before sintering, and to a limited extent in its fully sintered state. In its pre-sintered state, the material is relatively soft and easier to shape, but like many ceramics, it undergoes significant shrinkage—up to 20%—during sintering, which can affect final dimensions. Fully sintered magnesium oxide is very hard and brittle, requiring diamond tools and precision equipment for any post-sintering machining.
Machining Methods and Considerations
- Green or Bisque Machining: Easier to cut and form, suitable for complex shapes before firing.
- Sintering Shrinkage: Expect about 15–20% dimensional reduction during sintering, which impacts tolerance control.
- Post-Sintering Machining: Requires diamond grinding tools due to the material’s hardness and brittleness.
- Fragility: Fully sintered MgO is prone to chipping and fracture if not handled with care during machining.
- Tooling and Time: Machining dense MgO ceramics is time-consuming and requires specialized equipment.
Magnesium Oxide Ceramic Packaging
Magnesium Oxide Ceramic products are typically packaged in vacuum-sealed bags to prevent moisture or contamination and wrapped with foam to cushion vibrations and impacts during transport, ensuring the quality of the products in their original condition.
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