Niobium Sputtering Target

Niobium Sputtering Data Sheet

Reference:	HMST16
Material:	R04200, R04210
Purity:	99.5%-99.99%
Density:	8.57 g/cm3
Shape:	Flat, Rotary, or Customized
Bonding:	Unbongidng or Bonding

Niobium Sputtering Target

Niobium is a rare, silvery-gray transition metal with excellent corrosion resistance, electric conductivity, and high-temperature stability. Niobium Sputtering Target can usually reach a purity of more than 99.95% and has a small grain size, which ensures the quality of the coating. Niobium Sputtering Target is commonly applied in semiconductor manufacturing, thin film coatings, electronic components, etc. Shanghai Yuepeng can offer bonding services according to specific requirements.

Niobium Sputtering Target Material Chemical Composition

Material	Main Element (%)	Impurities (≤%)
	Nb	Fe	Si	Ni	W	Mo	Ti	Ta	Zr	Hf	O	C	H	N
RO4200	Bal.	0.0040	0.0040	0.0020	0.0050	0.0050	0.0020	0.0700	0.0200	0.0200	0.0150	0.0040	0.0015	0.0030
RO4210	Bal.	0.0100	0.0100	0.0050	0.0200	0.0100	0.0040	0.1000	0.0200	0.0200	0.0200	0.0100	0.0015	0.0100

Niobium Sputtering Target Specifications

Material Type	Niobium	Coefficient of Thermal Expansion	7.3 x 10-6/K
Symbol	Nb	Theoretical Density (g/cc)	8.57
Atomic Weight	92.90638	Z Ratio	0.492
Atomic Number	41	Sputter	DC
Color/Appearance	Gray, Metallic	Max Power Density (Watts/Square Inch)	100*
Thermal Conductivity	54 W/m.K	Type of Bond	Indium, Elastomer
Melting Point (°C)	2,468	Comments	Attacks W source.

Niobium Sputtering Target Stock Dimensions

Circular Sputtering Targets	Diameter	1.0″ 2.0″ 3.0″ 4.0″ 5.0″ 6.0″ up to 21″
Rectangular Sputtering Targets	Width x Length	5″ x 12″ 5””x 15″ 5″ x 20″ 5″ x 22″ 6″ x 20″
Thickness		0.125″, 0.25″

Niobium Sputtering Target Production Process

Generally prepared by powder metallurgy method, the purity of niobium powder should be above 99.95%. The specific process is as follows:

• Put the niobium powder in the vacuum heat treatment furnace for pre-gassing, then introduce hydrogen and continue heating for degassing.
• The degassed niobium powder is sintered once by vacuum hot pressing.
• The primary sintered product is then passed through a hot isostatic press to complete the secondary sintering process.
• After secondary sintering, the entire surface of the product is ground by machining to achieve the final product.

Niobium Sputtering Target Applications

• Flat Panel Displays and Liquid Crystal Displays: Niobium sputtering targets are used to manufacture high-quality displays that provide clear images and high contrast.
• Optical Lenses: In optical devices, niobium sputtering targets are used for coating to improve light transmission and durability.
• Solar Cells: Niobium sputtering targets are also used to produce solar cells to improve photovoltaic conversion efficiency.
• Glass Coating: Niobium sputtering targets are used in the surface coating of energy-saving glass with anti-reflective and heat-insulating properties.

Niobium Sputtering Target Packaging

The Niobium Sputtering Target is carefully placed in wooden cases or cartons with additional support from soft materials to prevent any shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.