Silicon Carbide Sputtering Target
Silicon Carbide Sputtering Target Purity: 2N5-4N Shape: Rectangular, Disc, or Tube Silicon Carbide S…
Our sputtering targets are high-quality materials used in thin-film deposition processes. Designed for precision, they provide excellent uniformity, adhesion, and durability, making them ideal for applications in electronics, solar panels, optics, and coatings. Our targets ensure consistent performance and high efficiency in creating advanced, high-performance films for a variety of industries.
Silicon Carbide Sputtering Target Purity: 2N5-4N Shape: Rectangular, Disc, or Tube Silicon Carbide S…
Boron Carbide Sputtering Target Purity: 99.5% Shape: Rectangular, Disc, Tube Boron Carbide Sputterin…
Molybdenum Custom Parts Molybdenum Custom Parts are made of high-purity molybdenum material, exhibit…
Molybdenum Sputtering Target Molybdenum Sputtering Target is a thin film deposition material, made o…
Aluminum Nitride Sputtering Target Aluminum Nitride Sputtering Target is made from high-purity alumi…
Tungsten Sputtering Target Tungsten Sputtering Target is made of high-purity tungsten powder, a…