Tantalum Sputtering Target

tantalum sputtering target

Tantalum Sputtering Target

  • Custom sizes and standard sizes in stock
  • Quick Lead Time
  • Competitive Price

Tantalum Sputtering Target is made from high-purity tantalum material through pressure processing, offering high chemical purity, fine grain size, good recrystallized structure, and excellent consistency along all three axes. As a leading supplier and manufacturer of premium tantalum products, Shanghai Yuepeng utilizes advanced machining centers to produce high-precision tantalum and tantalum alloy sputtering targets for a wide range of applications.

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Tantalum Sputtering Target Data Sheet

Reference:HMST22
Dimensions:Thickness: 0.125″-0.25″
Circular Sputtering Targets: 1.0″-21″ (diameter), or customized
Rectangular Sputtering Targets: 5″×12″, 5″×15″, 5″×20″, 5″×22″, 6″×20″, or customized
Material:R05200, R05400
Purity:99.9%, 99.95%, 99.99%, 99.999%
Forms:Flat Target, Rotary Target, or Custom Shapes
Bonding:Bonding or Unbonding

Tantalum Sputtering Target

Tantalum Sputtering Target is a high-purity tantalum metal material used in physical vapor deposition (PVD) processes to create thin film coatings. Known for its high melting point, corrosion resistance, and excellent conductivity, tantalum targets are widely applied in semiconductors, solar cells, flat-panel displays, and optical coatings. Their high purity and uniform microstructure ensure stable and reliable film quality.

  • tantalum sputtering target

Tantalum (Ta) Specifications

Tantalum is classified as a transition metal on the Periodic Table and is considered one of the refractory metals highly resistant to corrosion. Due to its excellent corrosion resistance and thermal stability, tantalum is widely used in electronics, aerospace, and chemical engineering, particularly in manufacturing electronic components, chemical reactors, and semiconductors.

Material TypeTantalumCoefficient of Thermal Expansion6.3 x 10-6/K
SymbolTaTheoretical Density (g/cc)16.6
Atomic Weight180.94788Z Ratio0.262
Atomic Number73SputterDC
Color/AppearanceGray Blue, MetallicMax Power Density (Watts/Square Inch)50*
Thermal Conductivity57 W/m.KType of BondIndium, Elastomer
Melting Point (°C)3,017CommentsForms good films.

Tantalum Sputtering Target Stock Dimensions

Tantalum sputtering targets are manufactured to precise tolerances to meet specific application requirements. Shanghai Yuepeng also offers bonding services, with the ability to customize dimensions and shapes based on customer specifications. The regular dimensions are as follows:

Circular Sputtering TargetsDiameter1.0”
2.0”
3.0”
4.0”
5.0”
6.0”
up to 21”
Rectangular Sputtering TargetsWidth x Length5” x 12”
5” x 15”
5” x 20”
5” x 22”
6” x 20”
Thickness0.125”, 0.25”

Tantalum Sputtering Target Material Chemical Composition

ElementR05200 (%, Max)R05400 (%, Max)
C0.010.01
O0.0150.03
N0.010.01
H0.00150.0015
Fe0.010.01
Mo0.020.02
Nb0.10.1
Ni0.010.01
Si0.0050.005
Ti0.010.01
W0.050.05

Tantalum Sputtering Target Manufacturing Process

The manufacturing process involves sintering high-purity tantalum powder into blocks and melting them into ingots via a high-vacuum electron beam. These ingots undergo repeated plastic deformation and annealing to produce target blanks with uniform grain structure, which are then welded to backplates and machined into the final product for semiconductor sputtering. Here is the typical production process:

  • Sintering
  • Vacuum Electron Beam Melting
  • Plastic Deformation
  • Annealing
  • Metallographic Inspection
  • Machining
  • Dimensional Inspection
  • Cleaning
  • Final Inspection

Tantalum  Sputtering Target Applications

The tantalum sputtering target, often called a bare target, is first soldered to a copper backing plate. It is then used in semiconductor or optical sputtering processes, where tantalum atoms are deposited as oxides onto a substrate to form a sputter coating. The main applications include:

  • Electronics and Semiconductors: Tantalum targets are widely used as barrier layers in integrated circuit (IC) manufacturing, particularly in copper interconnect technology. Tantalum’s high melting point and low resistance make it an ideal choice for these applications.
  • Anti-Corrosion Coatings: Due to its exceptional corrosion resistance, tantalum is frequently used to coat chemical equipment and metal surfaces exposed to harsh environments, helping to extend the service life of these materials.
  • Thin Films for Optics and Photonics: Tantalum targets are employed to create thin films with specific optical properties for use in various optical devices, displays, and sensors.
  • Medical Devices: With its excellent biocompatibility, tantalum is used to coat medical implants such as bone plates and joint prostheses, reducing the risk of rejection by the body.
  • Medical Devices

    • Tantalum and Tantalum Alloy

    • R05200, unalloyed tantalum, electron-beam furnace vacuum-arc melt, or both
    • R05400, unalloyed tantalum, powder-metallurgy consolidation.
    • R05255, tantalum alloy, 90 % tantalum, 10 % tungsten, electron-beam furnace of vacuum-arc melt, or both.
    • R05252, tantalum alloy, 97.5 % tantalum, 2.5 % tungsten, electron-beam furnace or vacuum-arc melt, or both.
    • R05240, tantalum alloy, 60 % tantalum, 40 % niobium, electron-beam furnace or vacuum-arc melt.

    Tantalum Sputtering Target Packaging

    The Tantalum Sputtering Target is carefully placed in wooden cases or cartons with additional support from soft materials to prevent any shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.

    Tantalum Properties

    ItemValue
    Atomic number73
    Crystal structureBody centred cubic
    Electronic structureXe 4f¹⁴ 5d³ 6s²
    Valences shown2,3,4,5
    Atomic weight( amu )180.9479
    Thermal neutron absorption cross-section( Barns )22
    Photo-electric work function( eV )4.1
    Natural isotope distribution( Mass No./% )180/ 0.012
    Natural isotope distribution( Mass No./% )181/ 99.988
    Atomic radius – Goldschmidt( nm )0.147
    Ionisation potential( No./eV )1/ 7.88
    Ionisation potential( No./eV )2/ 16.2
    ItemValue
    Material conditionUnannealed (Hard)
    Material conditionAnnealed (Soft)
    Poisson’s ratio0.342
    Poisson’s ratio0.342
    Bulk modulus( GPa )196.3
    Bulk modulus( GPa )196.3
    Tensile modulus( GPa )185.7
    Tensile modulus( GPa )185.7
    Hardness – Vickers( kgf mm⁻² )200
    Hardness – Vickers( kgf mm⁻² )90
    Tensile strength( MPa )760
    Tensile strength( MPa )172-207
    Yield strength( MPa )705
    Yield strength( MPa )310-380
    ItemValue
    Electrical resistivity( µOhmcm )13.5@20@20°C
    Superconductivity critical temperature( K )4.47
    Temperature coefficient( K⁻¹ )0.0035@0-100°C
    Thermal emf against Pt (cold 0C – hot 100C)( mV )0.33
    ItemValue
    Boiling point( °C )5425
    Density( gcm⁻³ )16.6@20°C
    ElementValue
    Melting point( °C )2996
    Latent heat of evaporation( J g⁻¹ )4165
    Latent heat of fusion( J g⁻¹ )174
    Specific heat( J K⁻¹ kg⁻¹ )140@25°C
    Thermal conductivity( W m⁻¹ K⁻¹ )57.5@0-100
    Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )6.5@0-100°C

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    We will check and get back to you in 24 hours.

    To customize your tantalum sputtering target, please provide the following details:

    1. Diameter (for the circular sputtering targets)
    2. Width × Length (for the rectangular sputtering targets)
    3. Thcikness (for the sputtering targets)
    4. Purity of the material
    5. Backing Plate (If bonding service is required, please specify the material and dimensions of the backing plate.）
    6. Quantity of the products you need
    7. Alternatively, you can provide a drawing with your specifications.

    Once we have these details, we can provide you with a quote within 24 hours.

    We carry a wide variety of tantalum and tantalum alloy products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

    DFARS (Defense Federal Acquisition Regulation Supplement) compliance is primarily concerned with the sourcing of materials for defense-related applications in the United States. According to DFARS, certain materials used in defense must be sourced from the United States or qualifying countries.

    If you have specific tantalum materials that are subject to DFARS, please let us know in advance and we will confirm.

    At Shanghai Yuepeng Tech, we take this responsibility seriously. We adhere to all applicable laws and regulations, including Section 1502 of the Dodd-Frank Act. Our company operates with a strict code of ethics and is committed to only partnering with suppliers who share our dedication to responsible sourcing. We support the initiatives and programs aimed at promoting “conflict-free” supply chains and work diligently to ensure that our products meet these standards.

    Main types include pure tantalum targets and tantalum alloy targets (e.g., TaN, TaW). They also come as rotating cylindrical sputtering targets and planar sputtering targets to suit different coating systems.

    The purity requirement is extremely high, especially for targets used in semiconductors. Purity typically ranges from 99.95% (3N5) to 99.999% (5N), with strict control over specific impurity elements to ensure the quality and electrical properties of the deposition film.

    High density (often near theoretical density) is critical because it reduces arcing and micro-particle generation during sputtering. This results in a more uniform, defect-free thin film, improves coating yield, and extends the target’s service life.

    Shanghai Yuepeng Tech, established in 2022 in Shanghai, China, is a specialized supplier and manufacturer of tantalum and tantalum alloys. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

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